发明名称 PROPERTY MEASUREMENT APPARATUS AND PROPERTY MEASUREMENT METHOD
摘要 Disclosed herein is a property measurement apparatus including: a first plate installed in a state of being rotatable and/or vibratable; and a second plate placed to face the first plate and provided with an impedance measurement section, wherein a stress caused by a distortion generated by rotating or vibrating the first plate to serve as a distortion given to a sample provided in a gap between the first and second plates is measured, and at the same time, the impedance measurement section measures the impedance of the sample.
申请公布号 US2012137753(A1) 申请公布日期 2012.06.07
申请号 US201213371881 申请日期 2012.02.13
申请人 HAYASHI YOSHIHITO;SONY CORPORATION 发明人 HAYASHI YOSHIHITO
分类号 G01N11/14 主分类号 G01N11/14
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