POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION

摘要

There is provided a polymerizable composition exhibiting high light-blocking effect in the infrared region and high light transparency in the visible region and being capable of forming a pattern with excellent resolution by alkali development, and a photosensitive layer, a permanent pattern, a wafer-level lens, a solid-state imaging device and a pattern forming method, each using the composition; and the composition contains a polymerization initiator, a polymerizable compound, a tungsten compound, an alkali-soluble binder, and an inorganic filler.