Semiconductor device, fabricating method thereof, and semiconductor package comprising the semiconductor device
摘要
PURPOSE: A semiconductor device, a manufacturing method thereof, and a semiconductor package including the same are provided to prevent a semiconductor substrate and a penetrating electrode to be shorted by preventing the damage of a via hole insulating layer when eliminating a first insulating layer of penetrating via. CONSTITUTION: A semiconductor substrate(10) comprises a first side(11) and a second side(12) opposed to the first side. An integrated circuit(13) is formed on the first side of the semiconductor substrate. A via hole(16) is separated from the integrated circuit and is provided within the semiconductor substrate. A penetrating electrode(20) comprises a conductive connection unit(26) and a barrier layer(24). The barrier layer is formed at the inner wall of the via hole. A trench(103) is formed at the second side of the semiconductor substrate. A re-wire(45) is electrically connected with the penetrating electrode.
申请公布号
KR20120058114(A)
申请公布日期
2012.06.07
申请号
KR20100119757
申请日期
2010.11.29
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, HO JIN;CHO, TAE JE;JANG, DONG HYEON;SONG, HO GEON;JEONG, SE YOUNG;KANG, UN BYOUNG;YOON, MIN SEUNG