发明名称 |
POWER SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND POWER MODULE |
摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem of a power semiconductor device switching at high speed that a high voltage is generated to cause dielectric breakdown of a thin insulating film thus destroying the semiconductor device. <P>SOLUTION: The semiconductor device comprises: a first conductivity type semiconductor substrate; a first conductivity type drift layer formed on the first main surface of the semiconductor substrate; a second conductivity type second well region formed to surround the cell region of the drift layer; a first well contact hole provided to penetrate a gate insulating film on the second well region; a second well contact hole provided to penetrate a field insulating film on the second well region; a source pad electrically connecting the second well regions each other and the source region of the cell region via source contact holes; a drain electrode; and a high impurity concentration well region beneath a part of the surface layer in the second well region and the second well contact hole. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012109602(A) |
申请公布日期 |
2012.06.07 |
申请号 |
JP20120022207 |
申请日期 |
2012.02.03 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
HINO SHIRO;MIURA NARIHISA;NAKADA SHUHEI;OTSUKA KENICHI;WATANABE AKIHIRO;FURUKAWA AKIHIKO;NAKAO YUKIYASU;IMAIZUMI MASAYUKI |
分类号 |
H01L27/04;H01L29/06;H01L29/12;H01L29/78 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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