发明名称 POWER SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND POWER MODULE
摘要 <P>PROBLEM TO BE SOLVED: To solve such a problem of a power semiconductor device switching at high speed that a high voltage is generated to cause dielectric breakdown of a thin insulating film thus destroying the semiconductor device. <P>SOLUTION: The semiconductor device comprises: a first conductivity type semiconductor substrate; a first conductivity type drift layer formed on the first main surface of the semiconductor substrate; a second conductivity type second well region formed to surround the cell region of the drift layer; a first well contact hole provided to penetrate a gate insulating film on the second well region; a second well contact hole provided to penetrate a field insulating film on the second well region; a source pad electrically connecting the second well regions each other and the source region of the cell region via source contact holes; a drain electrode; and a high impurity concentration well region beneath a part of the surface layer in the second well region and the second well contact hole. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012109602(A) 申请公布日期 2012.06.07
申请号 JP20120022207 申请日期 2012.02.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 HINO SHIRO;MIURA NARIHISA;NAKADA SHUHEI;OTSUKA KENICHI;WATANABE AKIHIRO;FURUKAWA AKIHIKO;NAKAO YUKIYASU;IMAIZUMI MASAYUKI
分类号 H01L27/04;H01L29/06;H01L29/12;H01L29/78 主分类号 H01L27/04
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