| 摘要 |
A plasma treatment device using a leakage current transformer of the present invention comprises: a chamber which provides a sealed space that has plasma formed therein, and in which a sample that has not been treated is accommodated; an exhaust unit which forms the inside of said chamber into a vacuum state; a plasma generation electrode which is fixed within said chamber, and in which an anode and a cathode are equipped by opposing each other; a variable power supplier which is installed on the outside of said chamber, and supplies power to said plasma generation electrode; and a leakage current transformer which is installed between said variable power supplier and said plasma generation electrode, and adjusts a voltage and a current that are applied to said plasma generation electrode. |
