| 发明名称 |
COMPOSITE SUBSTRATE AND PRODUCTION METHOD |
| 摘要 |
<p>[Problem] To provide a composite substrate comprising a silicon substrate having few lattice defects. [Solution] A composite substrate (40) comprises an insulating substrate (30) and a functional layer (21) having one main surface joined to the upper surface of the substrate (30). The dopant concentration of this functional layer (21) decreases from the other main surface in the thickness direction toward the substrate (30) side.</p> |
| 申请公布号 |
WO2012074009(A1) |
申请公布日期 |
2012.06.07 |
| 申请号 |
WO2011JP77677 |
申请日期 |
2011.11.30 |
| 申请人 |
KYOCERA CORPORATION;KITADA, MASANOBU;OGAWA, MOTOKAZU |
发明人 |
KITADA, MASANOBU;OGAWA, MOTOKAZU |
| 分类号 |
H01L21/02;H01L21/20;H01L21/205;H01L27/12 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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