发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, which is superior relating to tackiness of a layer of the photosensitive resin composition, gives a cured film with excellent flame retardancy after cured, exhibits high resolution and is alkali-developable, and to provide a photosensitive element using the composition. <P>SOLUTION: The photosensitive resin composition contains: (A) a polyimide precursor having a weight average molecular weight of 10,000 to 150,000; (B) a polyurethane resin; (C) a phosphorus-containing compound; (D) a photopolymerizable compound having at least one ethylenically unsaturated group in the molecule; and (E) a photopolymerization initiator. The (A) polyimide precursor is a specified polyimide precursor represented by general formula (1); and the (B) polyurethane resin contains a specified polyurethane resin expressed by general formula (2), which is a reaction product of an epoxy acrylate compound having an ethylenically unsaturated group and two or more hydroxyl groups, a diisocyanate compound and a diol compound having a carboxyl group. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012108235(A) 申请公布日期 2012.06.07
申请号 JP20100255784 申请日期 2010.11.16
申请人 HITACHI CHEM CO LTD 发明人 ITAGAKI SHUICHI;TSUCHIYA KATSUNORI;OHASHI TAKESHI;OTOMO SATOSHI
分类号 G03F7/037;C08F290/14;G03F7/004;G03F7/027;H05K3/28 主分类号 G03F7/037
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