| 摘要 |
A method chemically decontaminates a surface of a metal component of a primary circuit of a pressurized-water reactor, the surface contains an oxide layer. In a first stage, an oxidation step, a reduction step, and a first decontamination step are performed. The component is treated in the oxidation step with an aqueous solution containing an oxidizing agent, which converts trivalent chrome present in the oxide layer into hexavalent chrome. The component is treated in the reduction step with an aqueous solution containing a reducing agent for reducing excess oxidation agent from the oxidation step. The component is treated in the first decontamination step with an aqueous solution containing a decontamination acid that forms no antisoluble deposits with metal ions in the solution. The solution is fed through an ion exchanger for removing metal ions. In a second stage, the component is treated with an aqueous solution containing an oxalic acid. |
