发明名称 METHOD FOR MAINTAINING ETCHING LIQUID AND SYSTEM THEREFOR
摘要 <p>The purpose of the present invention is to provide a method for maintaining an etching liquid, which is capable of stabilizing an etching liquid and extending the life of the etching liquid by removing copper ions from the etching liquid, said copper ions greatly affecting the etching performance, thereby reducing cost and waste and eventually protecting environmental resources. The method for maintaining an etching liquid comprises: a step wherein an etching liquid, the performance of which is deteriorated due to copper ions that are accumulated as etching is carried out, is sent from an etching tank to a negative electrode chamber of an electrolytic cell that is separated by a cation-exchange membrane so as to perform electrolysis thereof; and a step wherein the electrolyzed negative electrode liquid in the negative electrode chamber is returned to the etching tank. The method for maintaining an etching liquid is characterized in that an acid solution is contained in a positive electrode chamber of the electrolytic cell and the electrolysis is performed such that the copper ion concentration in the etching liquid is maintained within the range of 0.1-10 g/L.</p>
申请公布号 WO2012073816(A1) 申请公布日期 2012.06.07
申请号 WO2011JP77170 申请日期 2011.11.25
申请人 EBARA-UDYLITE CO., LTD.;NISHIKATA JUNICHI;MURAYAMA TAKASHI;TANIMOTO JUICHI;ISHIKAWA KUMIKO 发明人 NISHIKATA JUNICHI;MURAYAMA TAKASHI;TANIMOTO JUICHI;ISHIKAWA KUMIKO
分类号 C23F1/46 主分类号 C23F1/46
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