| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition with which a resist pattern can be produced with excellent depth of focus, and a method for producing a resist pattern. <P>SOLUTION: [1] A resist composition comprises a resin having a structural unit expressed by the formula (a) [in the formula (a), R<SP POS="POST">2</SP>represents an aliphatic hydrocarbon group having 1-6 carbon atoms; R<SP POS="POST">3</SP>represents an aliphatic hydrocarbon group having 1-18 carbon atoms; A<SP POS="POST">1</SP>represents an alkanediyl group having 1-6 carbon atoms and the like], and an acid generator. [2] In a method for producing a resist pattern, the resist composition described in [1] is used. <P>COPYRIGHT: (C)2012,JPO&INPIT |
