发明名称 METHOD FOR PRODUCING NOVOLAC TYPE PHENOLIC RESIN, NOVOLAC TYPE PHENOLIC RESIN, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a novolac type phenolic resin that reduces the content of a residual monomer component in the resin to a ppm order without changing performance of the resin. <P>SOLUTION: In the method for producing a novolac type phenolic resin, a phenol and an aldehyde are reacted in the presence of an acid catalyst, and then added with a solvent having a higher boiling point than that of the monomer of the phenol and are subjected to heat treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012107090(A) 申请公布日期 2012.06.07
申请号 JP20100255545 申请日期 2010.11.16
申请人 TORAY IND INC 发明人 FUJITA YOJI;MIYABE RINJI
分类号 C08G8/04;G03F7/023 主分类号 C08G8/04
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