| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polycrystalline silicon cleaning apparatus which reliably removes impurities, achieves an excellent cleaning effect and can improve working efficiency. <P>SOLUTION: A plurality of supporting bases 6 having placing surfaces 61 of different gradients are arranged in cleaning chambers 21-25 of a cleaning tank 2. On both sides of a basket 3, protrusions 35 which are locked by a lifting machine 42 protrude outward in the width direction of the basket 3, and a pair of protrusions on each side are disposed in parallel with each other at an interval in the longitudinal direction. On both sides of the supporting base 6, a pair of guide frames 7 are vertically disposed which, when the basket 3 is put on the placing surface 61, are disposed between the pair of protrusions 35 and protrude upward from the placing surface 61 of the supporting base 6. <P>COPYRIGHT: (C)2012,JPO&INPIT |
