Method for Manufacturing a High-functional Pad Conditioner for Chemical Mechanical Planarization and High-functional Pad Conditioner produced thereby

摘要

PURPOSE: A manufacturing method of a high-functional conditioner for a CMP(chemical mechanical planarization) pad and a high-functional conditioner manufactured thereby are provided to properly process the shape of a cutting tip formed on the conditioner depending on the kind of a pad or slurry. CONSTITUTION: A manufacturing method of a high-functional conditioner for a CMP pad is as follows. A substrate is prepared. Multiple column or pyramid-shaped protruded parts are formed on a part or the whole of one surface of the substrate through laser processing to be separated from each other. A plane parallel to the surface of the substrate is formed on the top ends of the protruded parts. The surface of the substrate having the protruded parts is coated with a diamond layer.