发明名称 GAS DISCHARGE APPARATUS OF REACTION CHAMBER
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas discharge apparatus capable of suppressing generation of a chemical synthetic composition containing a harmful substance such as a tar-like material in an exhaust part at low cost. <P>SOLUTION: A gas discharge apparatus discharges a gas in a heating chamber 13 for forming a carbon nanotube by a vacuum pump 36. A cylindrical body 31 having a decompression chamber which is decompressed at a lower pressure than the heating chamber 13 is disposed in an exhaust gas route between the heating chamber 13 and the vacuum pump 36. At the same time, a cooler 34 is disposed at its downstream side. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012106877(A) 申请公布日期 2012.06.07
申请号 JP20100255432 申请日期 2010.11.16
申请人 HITACHI ZOSEN CORP 发明人 HIRAOKA KAZUYUKI;SUGIMOTO ITSUO;TAKANABE KOJI;TAKITANI TOSHIO;KIRA KOJI;HARADA MAKI;IMASAKA REISHI
分类号 C01B31/02 主分类号 C01B31/02
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