| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pellicle for lithography that prevents distortion of a mask mostly even when the pellicle is bonded to the mask. <P>SOLUTION: A pellicle film is stretched to be disposed on one end face of a pellicle frame via an adhesive layer, while an adhesive layer whose face on a mask bonding side is flat is disposed on the other end face of the pellicle frame, and the adhesive force of the adhesive layer is in a range of 1 N/m to 100 N/m. It is desirable that the flatness of the face on the mask bonding side of the adhesive layer is 15 μm or less and the flatness of the face of the adhesive layer to which the pellicle film is bonded is 15 μm or less. <P>COPYRIGHT: (C)2012,JPO&INPIT |
