| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for reducing a distance between a microlens and a photoelectric conversion part and facilitating microlens shape control. <P>SOLUTION: A manufacturing method of a solid-state image pickup device comprises: a step of forming a color filter layer including a plurality of color filters on a wiring structure disposed on a semiconductor substrate on which a plurality of photoelectric conversion parts are formed; a step of forming a photosensitive microlens material layer on the color filter layer; and a step of forming a latent image on the microlens material layer by exposing the microlens material layer using a photomask having a transmitted light quantity distribution corresponding to a density of a shading part having a smaller dimension than a resolution limit of an exposure device and forming a microlens by developing the microlens material layer. The color filter layer has a surface level difference. The microlens material layer has a surface level difference corresponding to the surface level difference of the color filter layer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
