发明名称 |
INSULATING SUBSTRATE AND METHOD FOR MANUFACTURING SAME |
摘要 |
The purpose of the present invention is to provide an insulating substrate capable of providing a light-emitting element having both superior insulation properties and light emission efficiency. The insulating substrate of the present invention has a metal substrate (valve metal substrate) and an insulating layer (valve metal anodic oxidation film) provided in part of the surface of the metal substrate. The insulating substrate has a total reflectivity of at least 85% in the wavelength region from 300 to 700 nm on the surface of the metal substrate, an average surface roughness (Ra) of 0.05 to 2.00 µm for the surface of the metal substrate, and a surface area difference (?S) of 0.7 to 50% obtained from the actual area (Sx) of the surface of the metal substrate and the geometrically measured area (SO). |
申请公布号 |
WO2012073875(A1) |
申请公布日期 |
2012.06.07 |
申请号 |
WO2011JP77341 |
申请日期 |
2011.11.28 |
申请人 |
FUJIFILM CORPORATION;HATANAKA YUSUKE;HOTTA YOSHINORI;UESUGI AKIO |
发明人 |
HATANAKA YUSUKE;HOTTA YOSHINORI;UESUGI AKIO |
分类号 |
H01L33/48;H01L33/60;H01L33/64 |
主分类号 |
H01L33/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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