| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt in which a focus margin (DOF) and a mask error factor (MEF) of a pattern which is acquired are favorable, and to provide a resist composition containing the salt. <P>SOLUTION: The salt is shown by formula (I), and the resist composition contains the salt. In the formula, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each denote a hydroxy group or an alkyl group, wherein a methylene group in the alkyl group may be replaced with an oxy group or the like; R<SP POS="POST">3</SP>denotes an alkyl group; l, m and n each denote an integer of 0-3; p denotes an integer of 1-3; a methylene group of a heterocyclic ring containing a sulfonium cation may be replaced with an oxy group or carbonyl group; R<SP POS="POST">4</SP>and R<SP POS="POST">5</SP>each denote a fluorine atom or a perfluoroalkyl group; L<SP POS="POST">1</SP>denotes a divalent saturated hydrocarbon group, wherein a methylene group in the group may be replaced with an oxy group or a carbonyl group; and Y denotes an aliphatic hydrocarbon group or a saturated cyclic hydrocarbon group, wherein a methylene group in the groups may be replaced with an oxy group or the like. <P>COPYRIGHT: (C)2012,JPO&INPIT |
