发明名称 PROJECTION OBJECTIVE LENS SYSTEM AND MICROLITHOGRAPHY SYSTEM USING THE SAME
摘要 <p>A projection objective lens system has lenses arranged orderly from the object plane to the image plane: a first lens group (S1) with positive focal power; a second lens group (S2) with negative focal power; a third lens group (S3) with positive focal power; a fourth lens group (S4) with negative focal power; a fifth lens group (S5) with positive focal power. The lens groups are divided into two sub-lens groups. A diaphragm (AS) is provided between the two sub-lens groups. The following conditions are met: 0.12<|L/f|<0.4, and ?R/R<1%, wherein, f is the effective focal length of the projection objective lens system, L is the distance between the object plane and the image plane, ?R is the maximum caliber difference between the light beams irradiated by various viewing fields at the diaphragm, and R is the maximum caliber of the light beam irradiated by the center viewing field of the diaphragm.</p>
申请公布号 WO2012072004(A1) 申请公布日期 2012.06.07
申请号 WO2011CN82945 申请日期 2011.11.25
申请人 SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.;ZHU, LIRONG 发明人 ZHU, LIRONG
分类号 G02B13/18;G03F7/20 主分类号 G02B13/18
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