发明名称 METHODS FOR PREVENTING CORROSION OF PLASMA-EXPOSED YTTRIA COATED CONSTITUENTS
摘要 In accordance with one embodiment of the present disclosure, a method for preventing corrosion of a plasma-exposed yttria-coated constituent from ambient acidic hydrolysis wherein the plasma-exposed yttria-coated constituent includes a hydrolysable acid precursor is disclosed. The method may include: removing the plasma-exposed yttria-coated constituent from a semiconductor processing assembly; binding the plasma-exposed yttria-coated constituent with flexible moisture wicking material; hydrolyzing the hydrolysable acid precursor with an overwhelming aqueous admixture to form a vitiated acidic compound, wherein the flexible moisture wicking material pulls the vitiated acidic compound away from the plasma-exposed yttria-coated constituent with capillary action; dehydrating the plasma-exposed yttria-coated constituent with additional flexible moisture wicking material to pull a latent amount of the vitiated acidic compound away from the plasma-exposed yttria-coated constituent; and isolating the plasma-exposed yttria-coated constituent from ambient moisture in a moisture obstructing enclosure.
申请公布号 WO2012020355(A3) 申请公布日期 2012.06.07
申请号 WO2011IB53459 申请日期 2011.08.03
申请人 LAM RESEARCH CORPORATION;LAM RESEARCH AG;SWAMI, GANAPATHY;LOEWENHARDT, PETER;YUNSANG, KIM 发明人 SWAMI, GANAPATHY;LOEWENHARDT, PETER;YUNSANG, KIM
分类号 H01L21/205 主分类号 H01L21/205
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