PLASMA PROCESSING DEVICE

摘要

A plasma processing device comprises: a vacuum chamber (30); a plasma reaction chamber (20), which is located in the vacuum chamber (30) and used for plasma processing techniques; a radio frequency power source (40), for providing radio frequency signals to the plasma reaction chamber (20); a radio frequency power transmission unit (10), for transmitting the radio frequency signals provided by the radio frequency power source (40) into the plasma reaction chamber (20) of the vacuum chamber (30). The radio frequency power transmission unit (10) comprises a transmission line (101) for transmitting the radio frequency signals, and an outer conductor (102) for shielding the electromagnetic field of the transmission line (101). The radio frequency transmission unit in the present invention has the outer conductor for shielding the electromagnetic field of the transmission line, so that it can effectively avoid the discharge of radio frequency signals in the vacuum chamber; it has, therefore, good security and low losses in power transmission.