发明名称 |
OPTICAL ELEMENT AND EXPOSURE APPARATUS |
摘要 |
An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate' s side of the projection optical system. |
申请公布号 |
EP1670038(B1) |
申请公布日期 |
2012.06.06 |
申请号 |
EP20040772252 |
申请日期 |
2004.08.26 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIRAI, TAKESHI;KOKUBUN, TAKAO;ISHIZAWA, HITOSHI;MURAKAMI, ATSUNOBU |
分类号 |
H01L21/027;G02B7/02;G02B13/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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