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发明名称
Mask etch process
摘要
申请公布号
EP1918775(A3)
申请公布日期
2012.06.06
申请号
EP20070020637
申请日期
2007.10.22
申请人
APPLIED MATERIALS, INC.
发明人
CHANDRACHOOD, MADHAVI, R.;SABHARWAL, AMITABH;LEUNG, TOI, YUE, BECKY;GRIMBERGEN, MICHAEL
分类号
(IPC1-7):G03F1/08
主分类号
(IPC1-7):G03F1/08
代理机构
代理人
主权项
地址
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