发明名称 |
Thermally isolated cryopanel for vacuum deposition systems |
摘要 |
The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy. |
申请公布号 |
US8192547(B2) |
申请公布日期 |
2012.06.05 |
申请号 |
US20070903727 |
申请日期 |
2007.09.24 |
申请人 |
GOTTHOLD DAVID WILLIAM;BRESNAHAN RICHARD CHARLES;PRIDDY SCOTT WAYNE;O'STEEN MARK LEE;VEECO INSTRUMENTS INC. |
发明人 |
GOTTHOLD DAVID WILLIAM;BRESNAHAN RICHARD CHARLES;PRIDDY SCOTT WAYNE;O'STEEN MARK LEE |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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