发明名称 Method of producing magnetoresistance effect element
摘要 The method of the present invention provides a magnetoresistance effect element, which is capable of having a high MR ratio, corresponding to high density recording and being suitably applied to a magnetoresistance device even though a barrier layer is thinned to reduce resistance of the magnetoresistance effect element. The method of producing the magnetoresistance effect element, which includes the barrier layer composed of an oxidized metal, a first magnetic layer contacting one of surfaces of the barrier layer and a second magnetic layer contacting the other surface thereof, comprises the steps of: laminating the barrier layer on the first magnetic layer with using a target composed of the oxidized metal; and laminating the second magnetic layer on the barrier layer. The barrier layer is annealed before laminating the second magnetic layer thereon.
申请公布号 US8191235(B2) 申请公布日期 2012.06.05
申请号 US20080340236 申请日期 2008.12.19
申请人 TAKAHASHI MIGAKU;TSUNODA MASAKIYO;KOMAGAKI KOUJIRO;UEHARA YUJI;SUNAGA KAZUYUKI;FUJITSU LIMITED;TOHOKU UNIVERSITY 发明人 TAKAHASHI MIGAKU;TSUNODA MASAKIYO;KOMAGAKI KOUJIRO;UEHARA YUJI;SUNAGA KAZUYUKI
分类号 G11B5/127;H04R31/00 主分类号 G11B5/127
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