发明名称 |
Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
摘要 |
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films. |
申请公布号 |
US8196070(B2) |
申请公布日期 |
2012.06.05 |
申请号 |
US20100685218 |
申请日期 |
2010.01.11 |
申请人 |
ISHIDA HIROYUKI;AIYAMA TAMIYA;MARUYAMA KOICHI;HOYA CORPORATION |
发明人 |
ISHIDA HIROYUKI;AIYAMA TAMIYA;MARUYAMA KOICHI |
分类号 |
G06F17/50;G03F1/00;G03F1/08;G06K9/00;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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