发明名称 Probe polishing method, program therefor, and probe apparatus
摘要 A probe polishing method is provided for polishing probes by brining a polishing member into slide-contact with probes through a mounting table having thereon the polishing member transferred from a first receiving part. The probe polishing method includes transferring the polishing member from the first receiving part to the mounting table; detecting a presence of foreign materials on a top surface of the polishing member mounted on the mounting table; transferring the polishing member from the mounting table to a second receiving part when the foreign materials are detected on the top surface of the polishing member; removing the foreign materials from the polishing member in the second receiving part; and transferring the polishing member from which the foreign materials are removed from the second receiving part to the first receiving part.
申请公布号 US8195324(B2) 申请公布日期 2012.06.05
申请号 US20090545184 申请日期 2009.08.21
申请人 TANAKA HIDEAKI;SANO SATOSHI;TOKYO ELECTRON LIMITED 发明人 TANAKA HIDEAKI;SANO SATOSHI
分类号 B24B51/00;G06F11/30;G06F19/00 主分类号 B24B51/00
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