发明名称 |
SUSCEPTOR AND SEMICONDUCTOR MANUFACTURING DEVICE |
摘要 |
PURPOSE: A susceptor and an apparatus for manufacturing a semiconductor are provided to prevent a susceptor of a carbon material from being damaged by chemical cleaning using hydrofluoric acid by coating a silicon carbide or an aluminum nitride film on a surface of the susceptor. CONSTITUTION: A susceptor(23) is formed into a single layer structure including an upper side contacting a substrate. One or more pockets(230) are formed on an upper side of the susceptor. One or more pockets are rotated by a rotary shaft(26) combined with a lower portion thereof. A bottom side(250) of the pocket is formed to be convex or concave. The rotary shaft is combined with a coupling groove of the rotary shaft formed in a lower portion of the susceptor.
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申请公布号 |
KR20120057395(A) |
申请公布日期 |
2012.06.05 |
申请号 |
KR20100119100 |
申请日期 |
2010.11.26 |
申请人 |
LG INNOTEK CO., LTD. |
发明人 |
JANG, SUC WON;SHIM, SANG KYUN;KANG, DAE SUNG |
分类号 |
H01L21/683;H01L21/205 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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