发明名称 SUSCEPTOR AND SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PURPOSE: A susceptor and an apparatus for manufacturing a semiconductor are provided to prevent a susceptor of a carbon material from being damaged by chemical cleaning using hydrofluoric acid by coating a silicon carbide or an aluminum nitride film on a surface of the susceptor. CONSTITUTION: A susceptor(23) is formed into a single layer structure including an upper side contacting a substrate. One or more pockets(230) are formed on an upper side of the susceptor. One or more pockets are rotated by a rotary shaft(26) combined with a lower portion thereof. A bottom side(250) of the pocket is formed to be convex or concave. The rotary shaft is combined with a coupling groove of the rotary shaft formed in a lower portion of the susceptor.
申请公布号 KR20120057395(A) 申请公布日期 2012.06.05
申请号 KR20100119100 申请日期 2010.11.26
申请人 LG INNOTEK CO., LTD. 发明人 JANG, SUC WON;SHIM, SANG KYUN;KANG, DAE SUNG
分类号 H01L21/683;H01L21/205 主分类号 H01L21/683
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