发明名称 MANUFACTURING METHOD OF INKJET HEAD AND INKJET HEAD
摘要 According to one embodiment, when an electrode protection film of an inorganic material, which is apt to form a pin hole by influence of roughness of a ground, is used, an electrode as a smoothed electrode is formed on the ground of the electrode protection film by a plating method, or a film is formed as a smoothed layer (film) by an inorganic coating material such as SIRAGUSITAL (trade name: New Technology Creating Institute Co., Ltd.), such that the thickness of the electrode protection film is 1.0μm or more, and the average surface roughness of the ground of the electrode protection film is 0.6μm or less.
申请公布号 US2012133709(A1) 申请公布日期 2012.05.31
申请号 US201113236596 申请日期 2011.09.19
申请人 SEKI MASASHI;SHIMOSATO MASASHI;TOSHIBA TEC KABUSHIKI KAISHA 发明人 SEKI MASASHI;SHIMOSATO MASASHI
分类号 B41J2/04;B23P17/00 主分类号 B41J2/04
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