| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of forming an appropriate ion energy distribution according to plasma treatment, as well as a plasma treatment method and a plasma treatment bias voltage determination method. <P>SOLUTION: The plasma treatment apparatus includes a vacuum chamber 11 having a placement stand 2 disposed inside the chamber and a DC pulse voltage generation unit 3 which applies a bias voltage, or a DC pulse voltage, to the placement stand 2. The DC pulse voltage generation unit 3 takes advantage of the fact that a peak in an ion energy distribution diagram consisting of ion energy values on a horizontal axis and ion frequencies on a vertical axis appears in correspondence to an amplitude value of the DC pulse voltage as it generates plural kinds of DC pulse voltages differing in the amplitude value from each other, whereby adjustment is made until an ion energy distribution pattern which forms an overlapping area in the distribution diagram in which peaks adjacent to each other overlap one on top of another becomes an appropriate pattern for plasma treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT |
