DOUBLE PATTERNING WITH INLINE CRITICAL DIMENSION SLIMMING

摘要

A method for double patterning a substrate (110, 310) is described. The double patterning method may include a litho/freeze/litho/etch (LFLE) technique that includes a first (critical dimension) CD slimming process to reduce the first CD (124, 325) to a first reduced CD (126, 326) and a second CD slimming process to reduce the second CD (144, 326) to a second reduced CD (146, 335).