| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an upper layer film-forming composition capable of forming a film on a photoresist without causing no intermixing with a photoresist film and for maintaining a stable film without being eluted in a medium such as water during liquid immersion exposure and forming an upper layer film which is easily dissolved in an alkaline developer and a method for forming a photoresist pattern. <P>SOLUTION: In an upper layer-forming composition covering a photoresist film for forming a pattern by irradiation, the composition comprises a resin which is dissolved in a developer for developing the photoresist film is dissolved in a solvent and the solvent has a viscosity at 20°C of less than 5.2×10<SP POS="POST">-3</SP>Pa s. In addition, the solvent does not cause intermixing between the photoresist film and the upper layer-forming composition and contains ethers and a hydrocarbon. <P>COPYRIGHT: (C)2012,JPO&INPIT |
