| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing method of a sapphire substrate capable of polishing a processing object surface of a ground sapphire substrate to desired surface accuracy. <P>SOLUTION: The processing method of the sapphire substrate comprises: rotating a chuck table holding a processed surface of the ground sapphire substrate on the upper side, and polish-feeding a polishing tool toward the processed surface of the sapphire substrate held on the chuck table while rotating the tool. A current value of power supplied to an electric motor for rotationally driving the polishing tool is detected, and polishing feed is performed so that the current value is constant. <P>COPYRIGHT: (C)2012,JPO&INPIT |
