RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND

摘要

There are provided a resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below [wherein A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.]