| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. <P>SOLUTION: The current embodiments include several flows optimizing a source, a mask, and projection optics, and various sequential iterative optimization steps combining any of the projection optics, the mask and the source. The projection optics are sometimes broadly referred to as "lenses", and therefore the optimization process may be termed source mask lens optimization (SMLO). The SMLO may be desirable over an existing source mask optimization (SMO) process or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. <P>COPYRIGHT: (C)2012,JPO&INPIT |
