发明名称 SEMICONDUCTOR DEVICES HAVING DUAL TRENCH, METHODS OF FABRICATING THE SAME, AND ELECTRONIC SYSTEM HAVING THE SAME
摘要 A semiconductor device having a dual trench and methods of fabricating the same, a semiconductor module, an electronic circuit board, and an electronic system are provided. The semiconductor device includes a semiconductor substrate having a cell region including a cell trench and a peripheral region including a peripheral trench. The cell trench is filled with a core insulating material layer, and the peripheral trench is filled with a padding insulating material layer conformably formed on an inner surface thereof and a core insulating material layer formed on an inner surface of the padding insulating material layer. The core insulating material layer has a greater fluidity than the padding insulating material layer.
申请公布号 US2012132976(A1) 申请公布日期 2012.05.31
申请号 US201213368556 申请日期 2012.02.08
申请人 KIM DONG-WON;SIM JAE-HWANG;KIM KEON-SOO;LEE YOUNG-HO;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DONG-WON;SIM JAE-HWANG;KIM KEON-SOO;LEE YOUNG-HO
分类号 H01L29/788;H01L29/06 主分类号 H01L29/788
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