| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film exposure method by which it is easy to form an alignment mark and to detect the formed alignment mark when a film with an exposure material film formed in an exposure pattern formation region on a film base material is continuously exposed, and by which meandering of the film can be accurately corrected and the film is stably exposed. <P>SOLUTION: In a film 2 with an exposure material film 21 formed in an exposure pattern formation region on a film base material 20, a chromatic burning material, chromatic photocurable material, or chromatic ink is applied to at least one of both the width-direction side edges of the film to form a side part coating film 22, and an alignment mark 2a is formed by irradiating the side part coating film 22 with a laser beam from an alignment mark forming part 14. The alignment mark 2a is used to detect meandering of the film and to adjust the position of a mask 12. <P>COPYRIGHT: (C)2012,JPO&INPIT |
