| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and a confirmation method for an exposure position, whereby an exposure position is easily confirmed when an exposure pattern formation area is exposed in more than one time or a plurality of he exposure pattern formation areas are simultaneously or continuously exposed. <P>SOLUTION: A target exposure member 2 includes an exposure pattern formation area and at least partial non-pattern formation area for the periphery thereof. A light discoloration material, which discolors by the emission of exposure light, is applied to an area situated on the extension of an exposure pattern in the non-pattern formation area of the target exposure member 2 or a light discoloration member that discolors by the emission of exposure light is patched to that area. When exposure light passed through a mask is emitted to the target exposure member, light is also emitted to a light discoloration area 22 formed from the discoloration material or discoloration member, in addition to the exposure pattern formation area, thereby discoloring this. Then, an exposure position in the exposure pattern formation area is confirmed through the discoloration of the light discoloration area 22, and the presence or absence of exposure failure is determined. <P>COPYRIGHT: (C)2012,JPO&INPIT |
