发明名称 SUBSTRATE PROCESSING APPARATUS, PROGRAM, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TRANSFER METHOD
摘要 <P>PROBLEM TO BE SOLVED: To determine whether an error exists in a processing part in real time and to prevent defective wafers from being manufactured in large numbers. <P>SOLUTION: An application and development processing apparatus comprises: a wafer transfer mechanism; a defect inspection part; transfer control means 200 for controlling wafer transfer; defect classification means 203 for classifying a defect based on the defect state; storage means 202 for storing a transfer route of the wafer processed by a processing unit by the wafer transfer mechanism; defect processing identification means 204 for identifying the processing unit where the classified defect occurred based on the type of the defect classified by the defect classification means 203 and the transfer route of the substrate stored by the storage means 202; and defect processing determination means for determining whether an error exists in the processing part in which the defect occurrence was identified. The transfer control means 200 controls the wafer transfer mechanism so that the wafer is transferred, bypassing the processing unit in which the defect processing identification means 204 identified the defect occurrence. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012104593(A) 申请公布日期 2012.05.31
申请号 JP20100250909 申请日期 2010.11.09
申请人 TOKYO ELECTRON LTD 发明人 HAYAKAWA MAKOTO;TOMITA HIROSHI;YOSHIDA TAPPEI
分类号 H01L21/027;H01L21/02;H01L21/66 主分类号 H01L21/027
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