发明名称 APPARATUS FOR PRODUCING FINE POWDER OF HIGH PURITY SILICON
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus for producing silicon, with which fine and uniform-sized silicon with high purity can be obtained with minimum energy and high efficiency, and moreover in large quantity. <P>SOLUTION: The apparatus for producing fine particles of high purity silicon comprises: (1) a device for heating and evaporating metallic zinc above the boiling point of zinc and simultaneously supplying zinc gas at above 1,000&deg;C by heating the generated gas; (2) a device for supplying liquid silicon tetrachloride into the zinc gas; (3) a device for generating a reaction gas including silicon particles by making the zinc gas and the liquid silicon tetrachloride react with each other by mix-stirring them; (4) a device for flocculating and growing silicon particles which are generated in the gas by lowering the temperature of the reaction gas to 1,000&deg;C or lower; and (5) a device for recovering precipitates for precipitating and recovering silicon in an aqueous solution by bringing the gaseous substance including the grown silicon particles in the reaction gas into contact with an aqueous solution of zinc chloride. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012101998(A) 申请公布日期 2012.05.31
申请号 JP20100265717 申请日期 2010.11.11
申请人 CS GIJUTSU KENKYUSHO:KK;TMC KK 发明人 KATO KENJI;SHIMAMUNE TAKAYUKI;SAKATA TOYOAKI
分类号 C01B33/033 主分类号 C01B33/033
代理机构 代理人
主权项
地址
您可能感兴趣的专利