发明名称 FUNCTIONALLY GRADIENT INORGANIC RESIST, SUBSTRATE WITH FUNCTIONALLY GRADIENT INORGANIC RESIST, CYLINDRICAL BASE MATERIAL WITH FUNCTIONALLY GRADIENT INORGANIC RESIST, METHOD FOR FORMING FUNCTIONALLY GRADIENT INORGANIC RESIST AND METHOD FOR FORMING FINE PATTERN, AND INORGANIC RESIST AND METHOD FOR FORMING THE SAME
摘要 A functionally gradient inorganic resist that changes in its state by heat, having a main surface irradiated with laser beams and a rear surface opposed to the main surface; the functionally gradient inorganic resist including a single layer resist, wherein at least a composition of the single layer resist is continuously varied from the main surface side to the rear surface side, and anisotropy of an area in which a temperature reaches a fixed temperature when being irradiated with laser beams locally, is continuously increased from the main surface side to the rear surface side in the single layer resist.
申请公布号 US2012135353(A1) 申请公布日期 2012.05.31
申请号 US201013381232 申请日期 2010.07.01
申请人 AMEMIYA ISAO;NAKATSUKA SAKAE;TANIGUCHI KAZUTAKE;KIMURA IKURU;HOYA CORPORATION 发明人 AMEMIYA ISAO;NAKATSUKA SAKAE;TANIGUCHI KAZUTAKE;KIMURA IKURU
分类号 G03F7/20;G03F7/004;G03F7/075 主分类号 G03F7/20
代理机构 代理人
主权项
地址