THINNING METHOD OF DRY FILM RESIST

摘要

PROBLEM TO BE SOLVED: To provide a thinning method of a dry resist film, more specifically a thinning method which allows for uniform thinning of a dry resist film continuously without causing any bubble in the step for removing resist.

SOLUTION: The thinning method of a dry film resist includes a step for processing the dry film resist of a substrate 5 to which the dry film resist is applied with process liquid, and a step for subsequently removing unnecessary dry film resist on the surface by using removal liquid. The removal liquid is used repeatedly in the removal step, and contains a defoaming agent.

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