发明名称 EXHAUST GAS TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a treatment device which properly treats and recovers reaction exhaust gas which is by-produced at the production of silicon by a zinc reduction method for reducing silicon tetrachloride by using zinc, and manufacturing high-purity silicon. <P>SOLUTION: In the treatment of the produced exhaust gas at the production of silicon by the zinc reduction method, the treatment device of exhaust gas comprises: a gas absorption dissolution mechanism which introduces the produced exhaust gas from the upper part of a tower in which a zinc chloride aqueous solution is made to circulate, and absorbs it; a circulation mechanism of the zinc chloride aqueous solution; a filter mechanism of the zinc chloride aqueous solution, which has absorbed the produced exhaust gas; a density adjustment mechanism of the zinc chloride aqueous solution which has absorbed the produced exhaust gas; and a holding mechanism of the zinc chloride aqueous solution which has performed the treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012101210(A) 申请公布日期 2012.05.31
申请号 JP20100265716 申请日期 2010.11.11
申请人 CS GIJUTSU KENKYUSHO:KK;TMC KK 发明人 KATO KENJI;SHIMAMUNE TAKAYUKI;SAKATA TOYOAKI
分类号 B01D53/64;B01D53/14;B01D53/68;B01D53/77;B03B5/00;C01B33/033;C02F1/461 主分类号 B01D53/64
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