发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which displays a process chamber, which is firstly used in the next sorting production, on an operation screen in advance. <P>SOLUTION: In the case where a given number of substrates (lot) are sequentially processed, a control controller provides information, which specifies a process chamber where a substrate to be transferred next is processed, to an operation part controller, when the given number of substrates are processed. Then, the operation part controller displays an icon on an operation screen, specifying the process chamber to which the substrate to be processed next is transferred, from among multiple process chambers. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012104702(A) 申请公布日期 2012.05.31
申请号 JP20100252881 申请日期 2010.11.11
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SHIRAKAWA MASATO
分类号 H01L21/02;H01L21/677 主分类号 H01L21/02
代理机构 代理人
主权项
地址