发明名称 SPUTTERING TARGET AND RECORDING MATERIAL OF HARD DISK FORMED FROM THE SPUTTERING TARGET
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target containing the combination of oxides which forms a recording layer of high definition and high recording density, and a recording material of a hard disk. <P>SOLUTION: The sputtering target basically comprises an alloy of cobalt-platinum (CoPt), cobalt-chrome-platinum (CoCrPt) or cobalt-chrome-platinum-boron (CoCrPtB), wherein silica oxide (SiO<SB POS="POST">2</SB>) and Cr<SB POS="POST">2</SB>O<SB POS="POST">3</SB>are added as an oxygen supplier during sputtering process to donate oxygen to the oxygen defects, and wherein the amount of silica oxide (SiO<SB POS="POST">2</SB>) ranges from 4 to 8 atom% and the amount of chromium oxide (Cr<SB POS="POST">2</SB>O<SB POS="POST">3</SB>) ranges from 0.8 atom% to 5 atom%. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012102399(A) 申请公布日期 2012.05.31
申请号 JP20110235432 申请日期 2011.10.26
申请人 SOLAR APPLIED MATERIALS TECHNOLOGY CORP 发明人 LIU WEN-TSANG;LIN SHOU-HSIEN
分类号 C23C14/34;G11B5/64;G11B5/851 主分类号 C23C14/34
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