| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming an organic-inorganic composite film by developing an organic-inorganic composite film having a high content of inorganic fine particles, and to provide a developing solution capable of developing an organic-inorganic composite film having a high content of inorganic fine particles. <P>SOLUTION: The following photosensitive film is exposed for patterning and developed. The photosensitive film contains: at least one kind of inorganic fine particles by 60 to 98 wt.% selected from the group consisting of silicon, metals, oxides of silicon or metals, nitrides of silicon or metals, carbonates of silicon or metals, and composites of at least two kinds in the above described compounds; and a photosensitive resin composition by 2 to 40 wt.% in terms of a solid content, comprising an alkali-soluble resin and a photopolymerization initiator. In the developing process, the photosensitive film is developed with a developing solution containing an acetylene alcohol-based surfactant having an HLB value of 7 to 18 by Griffin method, an alkali component and water. <P>COPYRIGHT: (C)2012,JPO&INPIT |
