发明名称 |
PHOTORESIST COMPOSITION AND METHOD FOR FORMING PHOTOLITHOGRAPHIC PATTERN |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition useful in forming a photolithographic pattern by a negative tone development process, a method for forming a photolithographic pattern, and a substrate coated with the photoresist composition. <P>SOLUTION: The present invention relates to a photoresist composition and a photo lithography method allowing formation of a fine pattern by using a negative tone development process. The photoresist composition contains a copolymer formed from a monomer a part of which contains a certain acetal moiety. The preferred composition and method of the present invention provide reduction of thickness loss in photo lithography treatment and improvement of a pattern collapse margin. For the composition, the method and a coated substrate, special applicability has been found in manufacturing a semiconductor device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012103679(A) |
申请公布日期 |
2012.05.31 |
申请号 |
JP20110195533 |
申请日期 |
2011.09.08 |
申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC;DOW GLOBAL TECHNOLOGIES LLC |
发明人 |
YANG CHOL-BAE;THOMAS CARDOLACCIA;SUN JIBIN;ARRIOLA DANIEL J;FRAZIER KEVIN A |
分类号 |
G03F7/038;C08F20/26;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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