摘要 |
A method and apparatus for forming an amorphous carbon layer on a substrate is provided. A first portion of the amorphous carbon layer having a high stress level is formed from a hydrocarbon precursor having high dilution ratio, with optional amine precursor included to add stress-elevating nitrogen. A second portion of the amorphous carbon layer having a low stress level is formed on the first portion by reducing the dilution ratio of the hydrocarbon precursor and lowering or eliminating the amine gas. Pressure, temperature, and RF power input may be adjusted instead of, or in addition to, precursor flow rates, and different precursors may be used for different stress levels. |
申请人 |
APPLIED MATERIALS, INC.;KONECNI, ANTHONY;LIU, JOSEPHINE, JUHWEI;PADHI, DENEESH;KIM, BOK, HOEN;MC CLINTOCK, WILLIAM, H. |
发明人 |
KONECNI, ANTHONY;LIU, JOSEPHINE, JUHWEI;PADHI, DENEESH;KIM, BOK, HOEN;MC CLINTOCK, WILLIAM, H. |