RADIATION-SENSITIVE COMPOSITION AND COMPOUND

摘要

The purpose of the present invention is to provide: a radiation-sensitive composition which has excellent sensitivity and improved resolution properties and can be formed into a patterned film that has a surface having improved smoothness (reduced nanoedge roughness); and a compound suitable for the radiation-sensitive composition. The present invention provides: a radiation-sensitive composition comprising [A] a compound represented by formula (1) and [B] a polymer having a constituent unit containing an acid-labile group; and a radiation-sensitive composition as mentioned above, wherein the compound [A] is at least one compound selected from the group consisting of a compound represented by formula (1-A) and a compound represented by formula (1-B).