| 摘要 |
A substrate processing system including a cleaning equipment; a resist coating equipment forming a resist layer on a surface of a substrate; an edge exposure equipment that exposes to light an edge portion of the resist layer formed on a peripheral edge of the substrate; a substrate transport mechanism; and a system controller. The system controller includes a waiting time monitor and a process controller. The waiting time monitor monitors a waiting time that is a time interval between the formation of the resist layer and start of the exposure of the edge portion of the resist layer. The process controller causes the substrate transport mechanism to transport the substrate into the cleaning equipment when the monitored waiting time exceeds a prescribed limit, removing the resist layer from the substrate. The process controller then causes the substrate transport mechanism to transport the substrate into the resist coating equipment.
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